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Electroporation / Transfection
Multi-Well Plate Electroporation Systems
Multi-Well Electroporation Plate Systems
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Multi-Well Electroporation Plate Systems
The Multi-Well Optimization System – MOS, is our newest multi-well electroporation technology for processing multiple samples in seconds. Using the new MOS Multi-Well Plates instead of traditional cuvettes, the researcher can transition from a single cuvette to a 96 or 25 sample plate, increasing yields and the number of experiments run in a single day.
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Applications: • Transfection of Mammalian Cells • Transformation of Bacteria and Yeast • siRNA and cDNA Library Screening FAST Run multiple samples in seconds for rapid optimization of electroporation variables and unsurpassed sample through-put. FLEXIBLE Complete user control over electroporation settings allows for a wide range of optimization flexibility. ECONOMICAL Saves valuable lab time, moves experiments further faster, provides reliable results and requires no expensive reagents. ACCURATE Eliminates cross-contamination with patented integrated electrodes and plate sealer.
The Multi-Well Optimization System – MOS, is our newest multi-well electroporation technology for processing multiple samples in seconds. Using the new MOS Multi-Well Plates instead of traditional cuvettes, the researcher can transition from a single cuvette to a 96 or 25 sample plate, increasing yields and the number of experiments run in a single day. These systems take seconds to run which allows quick and efficient optimization of the electrical and biological parameters associated with electroporation. Once optimized, samples are rapidly processed, increasing yields while saving valuable time and money. MOS Plates Each MOS plate consists of either 96 or 25 individual wells with integrated electrodes. The 96-well plate follows traditional 96-well format i.e., 12 columns of 8 wells each. The 25-well format has 5 columns of 5 wells each. Four different Multi-Well Plates are available: 96-well with 4 mm gap, 96-well with 2 mm gap, 25-well with 4 mm gap and 25-well with 2 mm gap. Plate Handler The plate handler accepts the MOS Multi-Well Plates and delivers the pulse parameters set in the ECM generator to the plate. Two Plate Handlers are available. The HT-200 Plate Handler delivers the applied pulse column by column automatically. The HT-100 Plate Handler requires manual switching from one column to the next. Both Plate Handlers apply the same settings to each well within a column. Generator The third component of the MOS System is a BTX Electroporation Generator which supplies the pulse to the Plate Handler. Select the Generator based on your application needs. See pages 9 and 10 for generator information and pages 14 and 15 for generator specifications guide.
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